Monocrystalline silicon growth furnace is the production of monocrystalline silicon by direct-pulling process equipment. Mainly by the main engine, heating power supply and computer control system of three major components.

1, the host part:

Rack, double column

Double-layer water-cooled structure furnace body

Water-cooled valve seat

Crystal Lifting and rotating mechanism

Crucible hoisting and rotating mechanism

Argon system

Vacuum system and automatic furnace pressure detection control

Water cooling system and various safety protection devices

Two feed ports left

2, Heater power supply:

All water-cooled power supply device uses patented power supply or imported IGBT and super fast recovery diode and other power devices. With special effects high-frequency transformers, forming a new generation of high-frequency switching power supply. Using phase-shifted full-bridge soft switch (ZVS) and CPU independent control technology, the power conversion efficiency is improved and no power factor compensation device is needed.

3. Computer control System:

Using PLC and Upper industrial Tablet PC, equipped with large-screen touch HMI Man-machine interface, high pixel CCD diameter ADC system and independent intellectual property "automatic CZ crystal growth SCADA Monitoring System", Can be realized from the vacuum-leak-furnace pressure control-melt-stability-melting-crystal-shoulder-shoulder----------------end-stop furnace whole process control.