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The Use Of Monocrystalline Silicon Wafer
- Mar 12, 2018 -

Monocrystalline silicon chips are mainly used to make semiconductor components.

Uses: is the manufacture of semiconductor silicon devices raw materials for high-power rectifier, high-power transistors, diodes, switch devices and so on

Now, our life everywhere visible "silicon" figure and role, crystalline silicon solar cells in the last 15 years to form the industrialization of the fastest.

Molten elemental silicon in the solidification of the silicon atom in the diamond lattice into many nuclei, if these nuclei grow to the same crystal surface orientation of the same grain, then these grains parallel together will crystallize into monocrystalline silicon.

Mono-crystalline silicon is usually made of polycrystalline silicon or amorphous silicon, and then a rod-like monocrystalline silicon is grown from the melt by direct-pulling or suspension-zone fusion.

Monocrystalline silicon rods are the raw materials for the production of monocrystalline silicon wafer, with the domestic and international market for the rapid increase in the demand for monocrystalline silicon ingot market demand is also showing a rapid growth trend.

Monocrystalline wafers are divided into 6 inches, 8 inches, 12 inches (300 mm) and 18 inches (450 mm) in diameter. The larger the diameter of the wafer, the more integrated circuits can be engraved, the lower the cost of the chip. But the requirements for materials and technology for large size wafers are higher. The crystal growth methods of monocrystalline silicon are divided into direct pulling method (CZ), Zone melting method (FZ) and Epitaxy method. Direct-pulling method, region fusion growth of monocrystalline silicon rod, epitaxial growth of monocrystalline silicon thin film. Direct-pulling growth of monocrystalline silicon is mainly used in semiconductor integrated circuits, diodes, epitaxial substrate substrates, solar cells. At present the crystal diameter can be controlled in φ3~8 inches. Zone fused single crystal is mainly used in High-voltage high-power controllable rectifier device field, widely used in high-power power transmission, electric locomotive, rectifier, frequency conversion, electromechanical integration, energy-saving lamps, televisions and other products, the current diameter can be controlled in φ3~6 inches. Epitaxial films are mainly used in the field of integrated circuits.